Analysis of a HPPMS system

Sara Gallian, Denis Eremin, Daniel Szeremley, Torben Hemke, Thomas Mussenbrock, Ralf Peter Brinkmann

DPG Früh­jahrs­ta­gung 2012, Stutt­gart, Ger­ma­ny, March 12-16


The High Power Pulsed Magnetron Sputtering (HPPMS) technique has gained substantial interest in both academic and industrial environments. Its most valuable features are: the high ionization degree of the sputtered material it allows to achieve, and the improved quality of the film deposited even on complex-shaped substrates. Several are the issues related to the modeling of a HPPMS: dense plasma in a strong magnetic filed, high ionization degree of the sputtered material, strong gas rarefaction and anomalous electron transport due to instabilities. In this paper, we present a simplified analytic approach to address what we believe are the most fundamental physical phenomena and some preliminary results obtained by means of hybrid models. The authors gratefully acknowledge the support by the Deutsche Forschungsgemeinschaft (DFG) via collaborative research centre SFB-TR 87.