Numerical investigation of dual frequency capacitively coupled hydrogen plasmas

Aurel Salabas, Ralf Peter Brinkmann

PSST. Volume 14, Number 2


Abstract

In this paper, a two-dimensional fluid model is used to investigate capacitively coupled hydrogen plasmas produced by a combination of two rf sources. We have tested the case when one electrode is simultaneously driven by the rf sources, as well as the case when two sources are connected to different electrodes. The results suggest that, according to the factor between the frequencies, either one or other configuration allows higher power coupling to the discharge. A simple analysis of the sheath dynamics is also performed. The simulations show an important modulation of the sheath width. In agreement with other analytical and numerical calculations, the results indicate that the amplitude of the modulation is stronger when the sheath thickness is small.

[DOI]

Tags: amplitude of the modulation, capacitively coupled hydrogen plasma, modulation of the sheath width, power coupling, sheath dynamics, sheath thickness, two-dimensional fluid model