course: Plasma Technology 1

teaching methods:
lecture with tutorials
overhead transparencies, black board and chalk
responsible person:
Prof. Dr.-Ing. Peter Awakowicz
Prof. Dr.-Ing. Peter Awakowicz (ETIT), M. Sc. Lars Schücke (ETIT)
offered in:
winter term

dates in winter term

  • start: Wednesday the 28.10.2020
  • lecture Wednesdays: from 08:30 to 10.00 o'clock in Online
  • tutorial Thursdays: from 08:15 to 09.45 o'clock in Online


Die Angaben zu den Prüfungsmodalitäten (im WiSe 2020/2021 | SoSe 2021) erfolgen vorbehaltlich der aktuellen Situation. Notwendige Änderungen aufgrund universitärer Vorgaben werden zeitnah bekanntgegeben.

Date according to prior agreement with lecturer.

Form of exam:oral
Registration for exam:FlexNow


Students are interested in plasma processes and technologies. They are able to describe and quantify generally plasma physics in considerations of applications and technological problems.


This lecture presents physical basics as a necessary introduction in the fields of plasma technology including all important terms and definitions as well as mathematical basics of plasma physics. One of the most important technologies of modern plasma technology is the reactive etching, which is e.g. used for micro structuring of electrical devices.

The lecture can be structured in three parts: First of all a picture-illustrated introduction is given to get into basic plasma concepts. In addition to the plasma description itself a lot of applications in low and high pressure plasmas are presented. The most important physical constants make a transition to the classification of plasma technology in a MOSFET production progression.

The second part is about general questions considering collisions between particles and equilibrium distributions of the different particles (electrons, photons, heavy particles and nuclear conditions). Afterwards, deviations from equilibrium distributions in typical low pressure plasmas are discussed. Other parts of basic principles are plasma dynamics, diffusion and ambipolar diffusion as well as plasma sheath. Two of the most important plasma machines are presented: the capacitively and inductively coupled radio frequency discharges.

The last part focuses on plasma etching. Here, different etching technologies and mechanisms are discussed. Basic problems such as selectivity, uniformity and anisotropy are main components of this part. Last, technological problems are presented.



recommended knowledge

  • fundamentals of mathematics, physics, and chemistry


presentation slides:


Im Wintersemester 2020/21 wird die­ser Kurs bis auf wei­te­res als on­line-ge­stütz­te Ver­an­stal­tung ohne Prä­senz­ver­an­stal­tun­gen durch­ge­führt. Die Ko­or­di­na­ti­on der Kurs­ak­ti­vi­tä­ten und die Bereitstellung von Materialien wird über Mood­le er­fol­gen.

Name des Mood­le-Kur­ses: Plasmatechnik 1 (141283-WiSe20/21)

Link zum Mood­le-Kurs:

Passwort zur Selbsteinschreibung: pt1ws2021